For customers requiring higher-resolution, TZTEK provides macro inspection products with resolution up to 1μm.
Available for wafer size 200/300 mm
Resolution up to 1 μm
Less Recipe settings, adapted for different types of products
Bright field and Dark field illumination modes
TZTEK’s system is easy to use and no recipe set up needed. It 100% ensures the wafer defect inspection during lithography process. The systems provides benefits for transferring from sampled inspection to full inspection and from manual to full automatic inspection.
Available for wafer size 150/200/300 mm
Support 100% wafer inspection during lithography process
Throughput up to 200 wph
Less recipe settings
Simultaneous front side and back side inspection